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Spreading resistance profiling
Known as:
SRP
Spreading resistance profiling (SRP), also known as spreading resistance analysis (SRA), is a technique used to analyze resistivity versus depth in…
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Related topics
Related topics
6 relations
Electron hole
Ohmic contact
Secondary ion mass spectrometry
Semiconductor
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Broader (1)
Semiconductor device fabrication
Papers overview
Semantic Scholar uses AI to extract papers important to this topic.
2014
2014
Library setup for epitaxial layer dopant profile using spreading resistance profiling analysis
Lim Saw Sing
,
L. Way
International Symposium on the Physical and…
2014
Corpus ID: 32813974
The paper describes an approach to establish library for epitaxial layer monitoring using spreading resistance profiling (SRP…
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2013
2013
Experimental and theoretical investigation of phosphorus in-situ doping of germanium epitaxial layers
Hyun‐Yong Yu
,
Enes Battal
,
+4 authors
K. Saraswat
2013
Corpus ID: 35292279
2011
2011
High n-Type Antimony Dopant Activation in Germanium Using Laser Annealing for $\hbox{n}^{+}/\hbox{p}$ Junction Diode
G. Thareja
,
S. Chopra
,
+4 authors
Y. Nishi
IEEE Electron Device Letters
2011
Corpus ID: 24416463
Highly activated n-type dopant is essential for n+/p germanium diodes which will be in use for source/drain regions in Ge n…
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2010
2010
Profiling N-Type Dopants in Silicon
M. Hovorka
,
F. Mika
,
P. Mikulík
,
L. Frank
2010
Corpus ID: 89615510
Variously doped n-type structures (dopant concentration between 1.5*10^16 cm^-3 and 1.5*10^19 cm^-3) on a lightly doped p-type…
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2009
2009
C-V profiling of ultra-shallow junctions using a buried layer with stepped doping
Cuiqin Xu
2009
Corpus ID: 58887091
2005
2005
Formation of silicon on plasma synthesized SiOxNy and reaction mechanism
M. Zhu
,
Xuejie Shi
,
+4 authors
P. Chu
2005
Corpus ID: 53127955
2005
2005
Modeling of boron and phosphorus implantation into (100) Germanium
Y. Suh
,
M. Carroll
,
R. Levy
,
M. Sahiner
,
G. Bisognin
,
C. King
IEEE Transactions on Electron Devices
2005
Corpus ID: 41316326
Boron and phosphorus implants into germanium and silicon with energies from 20 to 320 keV and ion doses from 5/spl times/10/sup…
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2000
2000
Spreading resistance profiling of ultrashallow junction NPN BJT with carrier redistribution effect
L. C. Tan
,
L. Tan
,
M. Leong
Other Conferences
2000
Corpus ID: 110702323
The spreading resistance profiling technique, when applied to ultra shallow junctions, requires the solution of the Poisson's…
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1994
1994
Effects of low dose silicon, carbon, and oxygen implantation damage on diffusion of phosphorus in silicon
S. Chaudhry
,
M. Law
1994
Corpus ID: 10152876
As device dimensions shrink to submicron levels, good design of ultrashallow junctions has become increasingly important. It is…
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1992
1992
SOI Material Properties Determined by Electrical Characterization
P. Rai-Choudhury
,
R. Hillard
,
+4 authors
M. Pawlik
European Solid-State Device Research Conference
1992
Corpus ID: 42678980
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