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Etching (microfabrication)

Known as: Acid polishing, Etching (disambiguation), Etching (microfab) 
Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important… 
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Related topics

Related topics

32 relations
CMOSCapacitive sensingCapacitively coupled plasmaChemical-mechanical planarization

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
Highly Cited
2010
Highly Cited
2010
High Quality Ge Virtual Substrates on Si Wafers with Standard STI Patterning
Further improving complementary metal oxide semiconductor performance beyond the 22 nm generation likely requires the use ofhigh… 
Highly Cited
2007
Highly Cited
2007
Rapid Prototyping in Copper Substrates for Digital Microfluidics
is a barrier to its growth and development. Conse-quently, DMF devices are limited to use in a few laboratoriesworldwide.The… 
Highly Cited
2006
Highly Cited
2006
Integrated CMOS-MEMS with on-chip readout electronics for high-frequency applications
A bridge-shaped first-lateral-mode 60-MHz mechanical resonator, which is monolithically integrated with capacitive CMOS readout… 
Highly Cited
1999
Highly Cited
1999
Observation of light propagation in photonic crystal optical waveguides with bends
We observed the light propagation in 2-D photonic crystal waveguides with bends, which were composed of densely-packed holes… 
Review
1999
Review
1999
Characterization of silicon surface preparation processes for advanced gate dielectrics
This paper gives a short overview of issues associated with the surface preparation of silicon surfaces for advanced gate… 
Highly Cited
1999
Highly Cited
1999
Low-Loss Passive Optical Waveguides Based on Photosensitive Poly(pentafluorostyrene-co-glycidyl methacrylate)
Low-loss optical waveguides have been fabricated from fluorinated copolymers designed to incorporate photochemical amplification… 
Highly Cited
1993
Highly Cited
1993
TMAH/IPA anisotropic etching characteristics
Highly Cited
1980
Highly Cited
1980
A general simulator for VLSI lithography and etching processes: Part II—Application to deposition and etching
The extension of the general process simulator SAMPLE to plasma etching and metallization is described. The etching algorithm is… 
Highly Cited
1979
Highly Cited
1979
A general simulator for VLSI lithography and etching processes: Part I—Application to projection lithography
A simulator is described which produces line-edge profiles at various key stages in integrated circuit processing. Optical models… 
Highly Cited
1979
Highly Cited
1979
Some chemical aspects of the fluorocarbon plasma etching of silicon and its compounds
Mass spectrometric sampling of fluorocarbon glow discharges and in situ measurements of the etch rate of Si and SiO2, with quartz… 
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